Molecular dynamics simulation of defect formation and precipitation in heavily carbon doped silicon

  • The precipitation process of silicon carbide in heavily carbon doped silicon is not yet fully understood. High resolution transmission electron microscopy observations suggest that in a first step carbon atoms form CSi dumbbells on regular Si lattice sites which agglomerate into large clusters. In a second step, when the cluster size reaches a radius of a few nm, the high interfacial energy due to the SiC/Si lattice misfit of almost 20% is overcome and the precipitation occurs. By simulation, details of the precipitation process can be obtained on the atomic level. A recently proposed parametrization of a Tersoff-like bond order potential is used to model the system appropriately. Preliminary results gained by molecular dynamics simulations using this potential are presented.

Export metadata

Statistics

Number of document requests

Additional Services

Share in Twitter Search Google Scholar
Metadaten
Author:Frank Zirkelbach, Jörg K. N. Lindner, K. Nordlund, Bernd StritzkerGND
Frontdoor URLhttps://opus.bibliothek.uni-augsburg.de/opus4/112291
ISSN:0921-5107OPAC
Parent Title (English):Materials Science and Engineering: B
Publisher:Elsevier BV
Place of publication:Amsterdam
Type:Article
Language:English
Year of first Publication:2009
Release Date:2024/04/05
Tag:Mechanical Engineering; Mechanics of Materials; Condensed Matter Physics; General Materials Science
Volume:159-160
First Page:149
Last Page:152
DOI:https://doi.org/10.1016/j.mseb.2008.10.010
Institutes:Mathematisch-Naturwissenschaftlich-Technische Fakultät
Mathematisch-Naturwissenschaftlich-Technische Fakultät / Institut für Physik
Mathematisch-Naturwissenschaftlich-Technische Fakultät / Institut für Physik / Lehrstuhl für Experimentalphysik IV
Dewey Decimal Classification:5 Naturwissenschaften und Mathematik / 53 Physik / 530 Physik